Symmetry‐Aware Mesh Segmentation into Uniform Overlapping Patches

dc.contributor.authorDessein, A.en_US
dc.contributor.authorSmith, W. A. P.en_US
dc.contributor.authorWilson, R. C.en_US
dc.contributor.authorHancock, E. R.en_US
dc.contributor.editorChen, Min and Zhang, Hao (Richard)en_US
dc.date.accessioned2018-01-10T07:42:40Z
dc.date.available2018-01-10T07:42:40Z
dc.date.issued2017
dc.description.abstractWe present intrinsic methods to address the fundamental problem of segmenting a mesh into a specified number of patches with a uniform size and a controllable overlap. Although never addressed in the literature, such a segmentation is useful for a wide range of processing operations where patches represent local regions and overlaps regularize solutions in neighbour patches. Further, we propose a symmetry‐aware distance measure and symmetric modification to furthest‐point sampling, so that our methods can operate on semantically symmetric meshes. We introduce quantitative measures of patch size uniformity and symmetry, and show that our segmentation outperforms state‐of‐the‐art alternatives in experiments on a well‐known dataset. We also use our segmentation in illustrative applications to texture stitching and synthesis where we improve results over state‐of‐the‐art approaches.We present intrinsic methods to address the fundamental problem of segmenting a mesh into a specified number of patches with a uniform size and a controllable overlap. Although never addressed in the literature, such a segmentation is useful for a wide range of processing operations where patches represent local regions and overlaps regularize solutions in neighbour patches. Further, we propose a symmetry‐aware distance measure and symmetric modification to furthest‐point sampling, so that our methods can operate on semantically symmetric meshes. We introduce quantitative measures of patch size uniformity and symmetry, and show that our segmentation outperforms state‐of‐the‐art alternatives in experiments on a well‐known dataset.en_US
dc.description.number8
dc.description.sectionheadersArticles
dc.description.seriesinformationComputer Graphics Forum
dc.description.volume36
dc.identifier.doi10.1111/cgf.12997
dc.identifier.issn1467-8659
dc.identifier.pages95-107
dc.identifier.urihttps://doi.org/10.1111/cgf.12997
dc.identifier.urihttps://diglib.eg.org:443/handle/10.1111/cgf12997
dc.publisher© 2017 The Eurographics Association and John Wiley & Sons Ltd.en_US
dc.subjectmesh segmentation
dc.subjectuniform overlapping patches
dc.subjectsymmetry-aware processing
dc.subjectfurthest-point sampling
dc.subjecttexture stitching
dc.subjecttexture synthesis
dc.subjectI.3.5 [Computer Graphics]: Computational Geometry and Object Modeling—Geometric algorithms
dc.subjectlanguages
dc.subjectand systems
dc.titleSymmetry‐Aware Mesh Segmentation into Uniform Overlapping Patchesen_US
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